ORIENTATION RELATIONSHIP OF ALIGNED CARBON-HYDROGEN COMPLEXES IN GAAS FORMED BY THE DECOMPOSITION OF TRIMETHYLGALLIUM TO THE DIRECTIONS OF THE (2X4) SURFACE RECONSTRUCTION OBSERVED DURING GROWTH

被引:22
作者
DAVIDSON, BR
NEWMAN, RC
KANEKO, T
NAJI, O
机构
[1] Interdisciplinary Research Center for Semiconductor Materials, Blackett Laboratory, Imperial College of Science, Technology and Medicine
来源
PHYSICAL REVIEW B | 1994年 / 50卷 / 16期
关键词
D O I
10.1103/PhysRevB.50.12250
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
GaAs layers have been grown by metal-organic molecular-beam epitaxy from trimethylgallium and cracked arsenic (As2) on (001)-oriented substrates held at 450 or 500°C, and the directions of the (2×4) surface reconstruction observed by high-energy electron diffraction were marked. Postgrowth infrared measurements using polarized light demonstrated that a carbon-hydrogen complex giving vibrational absorption at 2688 cm-1 was aligned along the [110] direction, perpendicular to the [1̄10] direction of the surface arsenic dimer bond. After hydrogen passivation in a plasma, this absorption was lost but was regenerated by annealing samples at 450 °C in a vacuum. The observations confirm a previous assignment of the 2688-cm-1 defect to a H-(CAs)2 complex. © 1994 The American Physical Society.
引用
收藏
页码:12250 / 12253
页数:4
相关论文
共 18 条
[1]   LPMOCVD GROWTH OF C-DOPED GAAS-LAYERS AND ALGAAS/GAAS HETEROJUNCTION BIPOLAR-TRANSISTORS [J].
ASHIZAWA, Y ;
NODA, T ;
MORIZUKA, K ;
ASAKA, M ;
OBARA, M .
JOURNAL OF CRYSTAL GROWTH, 1991, 107 (1-4) :903-908
[2]  
AVERY AR, 1993, MATER RES SOC SYMP P, V312, P219, DOI 10.1557/PROC-312-219
[3]   ALIGNED DEFECT COMPLEX CONTAINING CARBON AND HYDROGEN IN AS-GROWN GAAS EPITAXIAL LAYERS [J].
CHENG, Y ;
STAVOLA, M ;
ABERNATHY, CR ;
PEARTON, SJ ;
HOBSON, WS .
PHYSICAL REVIEW B, 1994, 49 (04) :2469-2476
[4]   CHEMICAL BEAM EPITAXIAL-GROWTH OF STRAINED CARBON-DOPED GAAS [J].
CHIU, TH ;
CUNNINGHAM, JE ;
DITZENBERGER, JA ;
JAN, WY .
APPLIED PHYSICS LETTERS, 1990, 57 (02) :171-173
[6]   ELECTRONIC LEVEL OF INTERSTITIAL HYDROGEN IN GAAS [J].
CLERJAUD, B ;
GENDRON, F ;
KRAUSE, M ;
ULRICI, W .
PHYSICAL REVIEW LETTERS, 1990, 65 (14) :1800-1803
[7]   MECHANISM OF CARBON INCORPORATION DURING GAAS EPITAXY [J].
CREIGHTON, JR ;
BANSENAUER, BA ;
HUETT, T ;
WHITE, JM .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1993, 11 (04) :876-883
[8]   DYNAMICS OF THE H-C(AS) COMPLEX IN GAAS [J].
DAVIDSON, BR ;
NEWMAN, RC ;
BULLOUGH, TJ ;
JOYCE, TB .
PHYSICAL REVIEW B, 1993, 48 (23) :17106-17113
[9]   A COMPARISON OF MBE AND MOMBE CBE GROWTH MECHANISMS USING MODULATED BEAM MASS-SPECTROMETRY AND RHEED [J].
FOXON, CT ;
GIBSON, EM ;
ZHANG, J ;
JOYCE, BA ;
LACKLISON, DE .
JOURNAL OF CRYSTAL GROWTH, 1991, 111 (1-4) :539-543
[10]   MODULATED MOLECULAR-BEAM AND RHEED STUDIES OF MBE AND MOMBE GROWTH [J].
GIBSON, EM ;
FOXON, CT ;
ZHANG, J ;
JOYCE, BA .
JOURNAL OF CRYSTAL GROWTH, 1990, 105 (1-4) :81-86