EPITAXIAL DEPOSITION OF SILICON-NITRIDE DURING POSTSINTERING HEAT-TREATMENT

被引：26

作者：

VETRANO, JS ^{[1
]}

KLEEBE, HJ ^{[1
]}

HAMPP, E ^{[1
]}

HOFFMANN, MJ ^{[1
]}

CANNON, RM ^{[1
]}

机构：

[1] UNIV CALIF BERKELEY,BERKELEY,CA 94720

来源：

JOURNAL OF MATERIALS SCIENCE LETTERS | 1992年 / 11卷 / 18期

关键词：

D O I：

10.1007/BF00729782

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

[No abstract available]

引用

收藏

页码：1249 / 1252

页数：4

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