OPTICAL-DAMAGE RESISTANCE OF LINBO3 THIN-FILM OPTICAL WAVE-GUIDES GROWN BY LIQUID-PHASE EPITAXY

被引：5

作者：

KONDO, Y ^{[1
]}

KOUYAMA, T ^{[1
]}

OHNO, K ^{[1
]}

TSUJI, M ^{[1
]}

NAKAMURA, M ^{[1
]}

FUJII, Y ^{[1
]}

机构：

[1] IBIDEN CO LTD,IBIGAWA,GIFU 50106,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1994年 / 33卷 / 3A期

关键词：

LINBO3; THIN-FILM WAVE-GUIDES; LIQUID-PHASE EPITAXY; PHOTOREFRACTIVE SENSITIVITY; OPTICAL DAMAGE; LI2O-V2O5; FLUX; LI2O-B2O3;

D O I：

10.1143/JJAP.33.L338

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Waveguides of 5 mol MgO-doped lithium niobate thin film are grown on a LiTaO3 substrate by liquid-phase epitaxy. The photorefractive sensitivity of the thin-film LiNbO3 waveguides using the Li2O-V2O5 flux and that of waveguides using Li2O-B2O3 flux are quantitatively measured and compared. The MgO-doped LiNbO3 thin-film waveguides grown using the Li2O-B2O3 flux are proven to be much more resistant to optical damage than those grown using the Li2O-V2O5 flux.

引用

页码：L338 / L341

页数：4

共 14 条

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