CHEMICAL VIEWS ON FORMATION OF TIN OXIDE-FILMS BY REACTIVE SPUTTERING

[1] BOVEY PE, 1969, 1 S EUR PULV CATH TO

[2] CHOPRA L, 1970, THIN FILM PHENOMENA

[3] GORDON F, 1957, HDB PHYSIK

[4] Guinier A, 1964, RADIOCRISTALLOGRAPHI

[5] Holland L., 1953, VACUUM, V3, P245

[6] Holland L., 1966, VACUUM DEPOSITION TH

[7] The Mechanism of Reactive Sputtering [J]. JOURNAL OF MATERIALS SCIENCE, 1968, 3 (05) : 544 - 552

[8] PAPOULAR R, 1963, PHENOMENES ELECTRIQU

[9] Pascal P., 1958, NOUVEAU TRAITE CHIMI, VIV

[10] Perny G., 1970, Thin Solid Films, V6, pr25, DOI 10.1016/0040-6090(70)90042-8

[1] BOVEY PE, 1969, 1 S EUR PULV CATH TO

[2] CHOPRA L, 1970, THIN FILM PHENOMENA

[3] GORDON F, 1957, HDB PHYSIK

[4] Guinier A, 1964, RADIOCRISTALLOGRAPHI

[5] Holland L., 1953, VACUUM, V3, P245

[6] Holland L., 1966, VACUUM DEPOSITION TH

[7] The Mechanism of Reactive Sputtering [J]. JOURNAL OF MATERIALS SCIENCE, 1968, 3 (05) : 544 - 552

[8] PAPOULAR R, 1963, PHENOMENES ELECTRIQU

[9] Pascal P., 1958, NOUVEAU TRAITE CHIMI, VIV

[10] Perny G., 1970, Thin Solid Films, V6, pr25, DOI 10.1016/0040-6090(70)90042-8