DETERMINATION OF THE LAYER STRUCTURE OF EMBEDDED STRAINED INGAAS MULTIPLE-QUANTUM WELLS BY HIGH-RESOLUTION X-RAY-DIFFRACTION

被引:10
作者
CHOI, WY
FONSTAD, CG
机构
[1] Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge
关键词
D O I
10.1063/1.109219
中图分类号
O59 [应用物理学];
学科分类号
摘要
High resolution x-ray diffraction (HRXRD) has been used to determine the layer compositions and thicknesses of compressively strained InGaAs multiple-quantum-well (MQW) structures embedded in thick cladding layers that are nominally lattice matched to InP. The entire layer structure was accurately determined from the results of HRXRD measurements for a simple strained MQW structure in which barriers and claddings are of the same composition. The estimated margins of error are less than 1 % for the quantum-well indium composition and +/-2.5 angstrom for well and barrier thicknesses. The layer structure of the active region in a complete InGaAlAs graded-index separate confinement strained MQW laser diode has also been determined by HRXRD.
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页码:2815 / 2817
页数:3
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