NONLINEARITY MEASUREMENTS ON PHOTOMETRIC DEVICES

被引：7

作者：

PITZ, E

机构：

[1] Max-Planck-Institut für Astronomie, Königstuhl, Heidelberg

来源：

APPLIED OPTICS | 1979年 / 18卷 / 09期

关键词：

D O I：

10.1364/AO.18.001360

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

An apparatus for the determination of deviations from linearity between incoming flux and the signal of a photometric device is presented.The response curve is formed exclusively from flux ratio measurements in the neighborhood of 1.0, which assures that the determination of a possible nonlinearity cannot be affected by the nonlinearity itself.© 1979 Optical Society of America.

引用

页码：1360 / 1362

页数：3