GROWTH OF THIN METAL FILMS UNDER APPLIED ELECTRIC FIELD (VACUUM DEPOSITION COALESCENCE OF NUCLEI E)

被引：59

作者：

CHOPRA, KL

机构：

来源：

关键词：

D O I：

10.1063/1.1754345

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：140 / +

页数：1

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[2]

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[5]

HIRTH JP, 1964, PROGRESS MATERIALS S, P27

[6]

HOUWINK L, 1960, P EUR REG C ELECTRON, V1, P341

[7]

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[8] GROWTH AND STRUCTURE OF ELECTRODEPOSITED THIN METAL FILMS [J].

LAWLESS, KR .

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[9]

NEUGEBAUER CA, 1959, STRUCTURE PROPERTIES, P11

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STOWELL, MJ ;

LAW, TJ .

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