ELABORATION AND OPTIMIZATION OF AMORPHOUS NA-AL-O THIN-FILMS

被引:24
作者
CAUDRON, E [1 ]
BAUD, G [1 ]
BESSE, JP [1 ]
JACQUET, M [1 ]
BLONDIAUX, G [1 ]
机构
[1] CNRS,CTR ETUD & RECH IRRADIAT,F-45071 ORLEANS 2,FRANCE
关键词
D O I
10.1016/0167-2738(92)90147-H
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Thin films (thickness: 0.1 to 1.5-mu-m) of Na-Al-O mixed oxides were obtained by RF-magnetron sputtering in order to prepare ionic conductors. The influence of the various sputtering parameters on the stability and the composition of the deposits is discussed. The maximum sodium content leading to stable deposits corresponds to a Na/Al ratio of 0.3.
引用
收藏
页码:189 / 192
页数:4
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