REGROWTH AND DEFECT REDUCTION IN UNCAPPED SE+ IMPLANTED (100) GAAS AFTER PULSED ELECTRON-BEAM ANNEALING

被引:3
作者
BARBIER, D [1 ]
LAUGIER, A [1 ]
DERUDET, B [1 ]
PIVOT, J [1 ]
机构
[1] UNIV LYON 1,DPM,F-69622 VILLEURBANNE,FRANCE
关键词
D O I
10.1016/S0022-0248(87)80018-0
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
引用
收藏
页码:725 / 732
页数:8
相关论文
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