RUTHERFORD SCATTERING ANALYSIS OF ANODIC TANTALUM-SILICON OXIDES

被引：27

作者：

SILVERMAN, PJ ^{[1
]}

SCHWARTZ, N ^{[1
]}

机构：

[1] BELL TEL LABS INC, INDIANAPOLIS, IN 46206 USA

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1974年 / 121卷 / 04期

关键词：

D O I：

10.1149/1.2401858

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：550 / 555

页数：6

共 24 条

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[9] DETERMINATION OF DENSITY AND DIELECTRIC CONSTANT OF THIN TA2O5 FILMS [J].

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