RF AND DC DISCHARGE CHARACTERISTICS FOR OPPOSED-TARGETS SPUTTERING

被引:18
作者
MATSUOKA, M
HOSHI, Y
NAOE, M
机构
[1] TOKYO INST POLYTECH, FAC ENGN, KANAGAWA 24302, JAPAN
[2] TOKYO INST TECHNOL, FAC ENGN, MEGURO KU, TOKYO 152, JAPAN
关键词
D O I
10.1063/1.337214
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:2096 / 2102
页数:7
相关论文
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