OXIDATION AND REDUCTION DURING FABRICATION OF HIGH QUALITY Nd1.85Ce0.15CuO4-y SUPERCONDUCTING THIN FILMS

被引：11

作者：

Mao, S. N. ^{[1
]}

Xi, X. X. ^{[1
]}

Bhattacharya, S. ^{[1
]}

Li, Qi ^{[1
]}

Peng, J. L. ^{[1
]}

Mao, J. ^{[1
]}

Wu, D. H. ^{[1
]}

Anlage, S. M. ^{[1
]}

Greene, R. L. ^{[1
]}

Venkatesan, T. ^{[1
]}

机构：

[1] Univ Maryland, Dept Phys, Ctr Superconduct Res, College Pk, MD 20742 USA

来源：

IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY | 1993年 / 3卷 / 01期

关键词：

D O I：

10.1109/77.233369

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Using pulsed-laser deposition and N2O reactive gas, we have successfully fabricated very high quality c-axis n-type Nd1.85Ce0.15CuO4-y (NCCO) oxide superconducting thin films epitaxially grown on different substrates. The film shows a superconducting transition temperature T-C( R = 0 Omega) of 22.4K and a transition width of 0.2K from ac susceptibility measurement. The critical current density J(C) is 8x10(5) A/cm(2) at 4.2K in zero magnetic field. The microwave surface resistance measured at 9.6 GHz shows a value of 3 m Omega at 4.2K in 500 nm-thick NCCO film, the best result reported so far for NCCO thin films. The oxygen deficiency is necessary to achieve the superconductivity in NCCO and the oxygen reduction during and after film deposition is critical. The oxidation and reduction processes are studied systematically for various substrate temperature, atmosphere and annealing duration

引用

页码：1552 / 1555

页数：4

共 15 条

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