EFFECT OF ROTATING SECONDARY PRINCIPAL STRESSES IN SCATTERED-LIGHT PHOTOELASTICITY

被引：7

作者：

CERNOSEK, J ^{[1
]}

机构：

[1] SO METHODIST UNIV,SOLID MECH CTR,INST TECHNOL,DALLAS,TX 75222

来源：

关键词：

D O I：

10.1007/BF02322723

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：273 / 279

页数：7

共 8 条

[1]

Aben H. K., 1966, EXP MECH, V6, P13

[2]

ANDERHOLT R, 1970, EXPTL MECHANICS, V10, P160

[3] Stress analysis by three-dimensional photoelastic methods [J].

Drucker, DC ;

Mindlin, RD .

Jones, RC .

[5]

PIPES LA, 1958, APPLIED MATHEMATICS

[6]

POINCARE H, 1889, THEORIE MATHEMATIQUE

[7]

RICHARTZ M, 1949, J OPT SOC AM, V136

[8] ANALYSIS OF SCATTERED-LIGHT METHODS IN PHOTOELASTICITY [J].

SRINATH, LS .