EVIDENCE OF ABSENCE OF ELECTRODE-LIMITED CONDUCTION IN THIN (GREATER-THAN 140 A) TA2O5 FILMS

被引：15

作者：

YOUNG, PL ^{[1
]}

机构：

[1] CORNING GLASS WORKS,CORNING,NY 14830

来源：

JOURNAL OF APPLIED PHYSICS | 1975年 / 46卷 / 06期

关键词：

D O I：

10.1063/1.321919

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2794 / 2795

页数：2

共 15 条

[1] ASYMMETRIC CONDUCTION IN THIN FILM TANTALUM/TANTALUM OXIDE-METAL STRUCTURES - INTERSTITIAL AND SUBSTITUTIONAL IMPURITY EFFECTS AND DIRECT DETECTION OF FLAW BREAKDOWN
AXELROD, NN
SCHWARTZ, N
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (04) : 460 - &
[2] DELLOCA CJ, 1971, PHYS THIN FILMS, V6, P1, DOI DOI 10.1016/B978-0-12-533006-0.50008-6
[3] ELECTRON TRANSFER PROCESSES TRHOUGH TANTALUM-TANTALUM-OXIDE DIODES
FLANNERY, WE
POLLACK, SR
[J]. JOURNAL OF APPLIED PHYSICS, 1966, 37 (12) : 4417 - &
[4] ON DISTINGUISHING BETWEEN SCHOTTKY AND POOLE-FRENKEL EFFECTS IN INSULATORS
MARK, P
HARTMAN, TE
[J]. JOURNAL OF APPLIED PHYSICS, 1968, 39 (04) : 2163 - &
[5] ELECTRICAL INTERFACE BARRIERS
MCGILL, TC
MEAD, CA
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (01): : 122 - 127
[6] ELECTRON TRANSPORT MECHANISMS IN THIN INSULATING FILMS
MEAD, CA
[J]. PHYSICAL REVIEW, 1962, 128 (05): : 2088 - &
[7] CURRENT TRANSPORT, EFFECTIVE DIELECTRIC CONSTANT, AND TEMPERATURE OF TA2O5 THIN FILMS
OCLOCK, GD
[J]. APPLIED PHYSICS LETTERS, 1971, 19 (10) : 403 - &
[8] DIELECTRIC PROPERTIES OF TA2O5 THIN FILMS
PULFREY, DL
WILCOX, PS
YOUNG, L
[J]. JOURNAL OF APPLIED PHYSICS, 1969, 40 (10) : 3891 - &
[9] EFFECT OF AMBIENTS AND CONTACT AREA ON ASYMMETRIC CONDUCTION OF ANODIC TANTALUM OXIDE FILMS
SCHWARTZ, N
GRESH, M
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (03) : 295 - &
[10] POTENTIAL BARRIERS + EMISSION-LIMITED CURRENT FLOW BETWEEN CLOSELY SPACED PARALLEL METAL ELECTRODES
SIMMONS, JG
[J]. JOURNAL OF APPLIED PHYSICS, 1964, 35 (08) : 2472 - &

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