ACCURATE H-3 DYNAMICS ON AN ACCURATE H-3 POTENTIAL SURFACE

被引：184

作者：

WALKER, RB

STECHEL, EB

LIGHT, JC

机构：

[1] UNIV CHICAGO,JAMES FRANCK INST,CHICAGO,IL 60637

[2] UNIV CHICAGO,DEPT CHEM,CHICAGO,IL 60637

来源：

JOURNAL OF CHEMICAL PHYSICS | 1978年 / 69卷 / 06期

关键词：

D O I：

10.1063/1.436861

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

[No abstract available]

引用

收藏

页码：2922 / 2923

页数：2

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