ND-LITAO3 WAVE-GUIDE LASER

被引：14

作者：

SANFORD, NA ^{[1
]}

AUST, JA ^{[1
]}

MALONE, KJ ^{[1
]}

LARSON, DR ^{[1
]}

ROSHKO, A ^{[1
]}

机构：

[1] NATL INST STAND & TECHNOL,SUPERCONDUCTOR & MAGNET MEASUREMENTS GRP,BOULDER,CO 80303

来源：

OPTICS LETTERS | 1992年 / 17卷 / 22期

关键词：

D O I：

10.1364/OL.17.001578

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Waveguide lasers operating near 1092 and 1076 nm were fabricated in Z-cut Nd-Ti codiffused LiTaO3. The Nd diffusion was at 1400-degrees-C for 120 h. Samples from two wafers were examined. The Nd film starting thickness was 7 nm in wafer 1 and 15 nm in wafer 2. Ti stripes, 8-15 mum wide, were diffused at 1500-degrees-C for 4 h for wafer 1 (130-nm stripe thickness) and 2 h for wafer 2 (100-nm stripe thickness). Pumping was at 750 nm. Threshold occurred at 330 mW of absorbed pump power for the best waveguides from wafer 1 and 100 mW for the best waveguides from wafer 2. The slope efficiency of the latter was 0.07%.

引用

页码：1578 / 1580

页数：3

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