LASER PURIFICATION OF SILANE - IMPURITY REDUCTION TO THE SUB-PART-PER-MILLION LEVEL

被引：9

作者：

HARTFORD, A

HUBER, EJ

LYMAN, JL

CLARK, JH

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1980年 / 51卷 / 08期

关键词：

D O I：

10.1063/1.328268

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：4471 / 4474

页数：4

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