CHARACTERISTICS OF ELECTRON-BEAM-CONTROLLED XEF LASER

被引：5

作者：

CHAMPAGNE, LF

HARRIS, NW

机构：

来源：

APPLIED PHYSICS LETTERS | 1978年 / 33卷 / 03期

关键词：

D O I：

10.1063/1.90315

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：248 / 250

页数：3

共 10 条

[1]

BURNHAM R, 1976, APPL PHYS LETT, V29, P709

[2] INFLUENCE OF DILUENT GAS ON XEF LASER [J].

CHAMPAGNE, LF ;

HARRIS, NW .

APPLIED PHYSICS LETTERS, 1977, 31 (08) :513-515

[3] 1-MUS LASER-PULSES FROM XEF [J].

CHAMPAGNE, LF ;

EDEN, JG ;

HARRIS, NW ;

DJEU, N ;

SEARLES, SK .

APPLIED PHYSICS LETTERS, 1977, 30 (03) :160-161

[4]

CHAMPAGNE LF, 1977, 1977 IEEE OSA C LAS

[5]

FORESTIER B, 1977, 4TH C EL TRANS LAS M

[6] COMPACT HIGH-PRESSURE ELECTRON-BEAM-CONTROLLED LASER SYSTEM [J].

HARRIS, NW ;

ONEILL, F ;

WHITNEY, WT .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1977, 48 (08) :1042-1046

[7]

JACOB JH, 1977, 30TH ANN GEC PAL ALT

[8]

PALUMBO LJ, COMMUNICATION

[9] PLASMA-INDUCED FIELD-EMISSION AND CHARACTERISTICS OF HIGH-CURRENT RELATIVISTIC ELECTRON FLOW [J].

PARKER, RK ;

ANDERSON, RE ;

DUNCAN, CV .

JOURNAL OF APPLIED PHYSICS, 1974, 45 (06) :2463-2479

[10] NEW COLD CATHODE FOR PULSED ION LASERS [J].

SIMMONS, WW ;

WITTE, RS .

IEEE JOURNAL OF QUANTUM ELECTRONICS, 1970, QE 6 (10) :648-&

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