ELECTRIC-FIELD-INDUCED SHIFT OF INTERFERENCE PEAKS OF THIN TANTALUM OXIDE FILMS

被引：8

作者：

FROVA, A

MIGLIORA.P

机构：

来源：

APPLIED PHYSICS LETTERS | 1968年 / 13卷 / 09期

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D O I：

10.1063/1.1652635

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：328 / &

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[7] KURTZ SK, 1966, P INT M FERROELECTRI, V1, P413
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