LEAD AND URANIUM STAIN ARTIFACTS IN ELECTRON-MICROSCOPY - TECHNIQUE FOR MINIMIZING THEIR OCCURRENCE

被引：5

作者：

THAETE, LG

机构：

[1] Department of Anatomy, Loma Linda University, School of Medicine, Loma Linda, California

来源：

JOURNAL OF MICROSCOPY | 1979年 / 115卷 / MAR期

关键词：

D O I：

10.1111/j.1365-2818.1979.tb00170.x

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

A new technique is presented which significantly reduced the occurrence of artefacts by eliminating the air‐stain interface when staining thin sections of biological material. It is designed for simultaneous treatment of large numbers of samples. The experiment described deals mainly with the specific staining problems encountered when using grids coated with Formvar. 1979 Blackwell Science Ltd

引用

页码：195 / 201

页数：7

共 17 条

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