OXIDATION KINETICS OF SINGLE CRYSTAL TITANIUM NITRIDE BY OPTICAL MEASUREMENTS

被引：7

作者：

PEARCE, ML

BASCH, C

机构：

[1] Division of Air Reduction Company, Incorporated, New York, 14302, Niagara Falls

来源：

JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1969年 / 52卷 / 09期

关键词：

D O I：

10.1111/j.1151-2916.1969.tb09201.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Oxidation of single crystals of titanium nitride was studied from 540° to 780°C using the optical interference produced by the thin oxide film formed on the surface. The kinetics are strictly diffusion‐controlled rather than reaction‐controlled, as observed by other workers for the initial oxidation of the polycrystalline material. This conflict is rationalized on the basis of the material differences and particularly the crystalline nature and perfection of the oxide film. The activation energy derived is in excellent agreement with that reported in the literature for the diffusion‐controlled oxidation of polycrystalline titanium nitride and titanium metal. Copyright © 1969, Wiley Blackwell. All rights reserved

引用

页码：496 / &