EVALUATION OF MASS-TRANSPORT IN COPPER AND ZINC ELECTRODEPOSITION USING TRACER METHODS

被引：26

作者：

WANG, HM

CHEN, SF

OKEEFE, TJ

DEGREZ, M

WINAND, R

机构：

[1] UNIV MISSOURI,DEPT MET ENGN,ROLLA,MO 65401

[2] UNIV LIBRE BRUXELLES,DEPT MET ELECTROCHEM,B-1050 BRUSSELS,BELGIUM

来源：

JOURNAL OF APPLIED ELECTROCHEMISTRY | 1989年 / 19卷 / 02期

关键词：

D O I：

10.1007/BF01062297

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：174 / 182

页数：9

共 51 条

[1]

[Anonymous], 1980, ELECTROCHEMICAL METH

[2] CONCENTRATION PROFILE OF CUSO4 IN CATHODIC DIFFUSION LAYER [J].

AWAKURA, Y ;

KONDO, Y .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1976, 123 (08) :1184-1192

[3] STUDIES ON VELOCITY PROFILE IN NATURAL-CONVECTION DURING COPPER DEPOSITION AT VERTICAL CATHODES [J].

AWAKURA, Y ;

TAKENAKA, Y ;

KONDO, Y .

ELECTROCHIMICA ACTA, 1976, 21 (10) :789-797

[4]

BASTIN V, 1987, REPORT METALLURGIE H

[5] A CONTRIBUTION TO THEORY OF ELECTROLYTIC CHLORATE FORMATION [J].

BECK, TR .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (07) :1038-&

[6]

BESSON J, 1970, J CHIM PHYS, V67, P1097

[7] COMBINED EFFECTS IN MASS-TRANSFER TO A PLANAR ELECTRODE [J].

BIRKETT, MD ;

KUHN, A .

ELECTROCHIMICA ACTA, 1977, 22 (12) :1427-1429

[8]

Brenner A, 1940, P AM ELECTROPLATERS, V95, P4

[9] EFFECT OF POLISHING WITH DIFFERENT SIZE ABRASIVES ON THE CURRENT RESPONSE AT A ROTATING-DISK ELECTRODE [J].

BRUCKENSTEIN, S ;

SHARKEY, JW ;

YIP, JY .

ANALYTICAL CHEMISTRY, 1985, 57 (01) :368-371

[10]

CHEN SF, 1987, 5TH AES CONT STRIP P

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