USE OF MULTIPLE PHOTO-EXCITATION IN AN OPTICALLY THICK SILICON-ALUMINIUM PLASMA TO OBTAIN LASING AT 44 A

被引：7

作者：

APRUZESE, JP

DAVIS, J

WHITNEY, KG

机构：

来源：

JOURNAL OF PHYSICS B-ATOMIC MOLECULAR AND OPTICAL PHYSICS | 1978年 / 11卷 / 20期

关键词：

D O I：

10.1088/0022-3700/11/20/009

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

收藏

页码：L643 / L649

页数：7

相关论文

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[8] CONVERSION EFFICIENCIES OF LASER TO X-RAY ENERGY IN C, F, AND AL PLASMAS
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