TRANSMISSION SPUTTERING AND RECOIL IMPLANTATION FROM THIN METAL-FILMS UNDER ION-BOMBARDMENT

[1] Carter G., 1968, ION BOMBARDMENT SOLI

[2] PRODUCTION RATES OF ELECTRICAL RESISTIVITY IN COPPER AND ALUMINUM INDUCED BY ELECTRON IRRADIATION [J]. PHYSICAL REVIEW, 1966, 146 (02): : 468 - &

[3] JOHNSON WS, 1969, PROJECTED RANGE STAT

[4] Kaminsky M., 1965, ATOMIC IONIC IMPACT, DOI 10.1007/978-3-642-46025-8

[5] Lindhard J., 1963, KGL DANSKE VIDENSKAB, V33

[6] Nelson R. S., 1969, Radiation Effects, V2, P47, DOI 10.1080/00337576908235579

[7] NESMEYANOV AN, 1963, VAPOUR PRESSURE CHEM, P231

[8] PERKINS JG, 1970, AWRE0970 UKAEA REP

[9] PERKINS JG, 1971, THESIS U SURREY

[10] PERKINS JG, 1970, P INT C THIN FILMS C, P323

[1] Carter G., 1968, ION BOMBARDMENT SOLI

[2] PRODUCTION RATES OF ELECTRICAL RESISTIVITY IN COPPER AND ALUMINUM INDUCED BY ELECTRON IRRADIATION [J]. PHYSICAL REVIEW, 1966, 146 (02): : 468 - &

[3] JOHNSON WS, 1969, PROJECTED RANGE STAT

[4] Kaminsky M., 1965, ATOMIC IONIC IMPACT, DOI 10.1007/978-3-642-46025-8

[5] Lindhard J., 1963, KGL DANSKE VIDENSKAB, V33

[6] Nelson R. S., 1969, Radiation Effects, V2, P47, DOI 10.1080/00337576908235579

[7] NESMEYANOV AN, 1963, VAPOUR PRESSURE CHEM, P231

[8] PERKINS JG, 1970, AWRE0970 UKAEA REP

[9] PERKINS JG, 1971, THESIS U SURREY

[10] PERKINS JG, 1970, P INT C THIN FILMS C, P323