ROOM TEMPERATURE OXIDATION OF TITANIUM THIN FILMS

被引：17

作者：

MINDEL, MJ

POLLACK, SR

机构：

[1] School of Metallurgy and Materials Science, University of Pennsylvania

来源：

ACTA METALLURGICA | 1969年 / 17卷 / 12期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1016/0001-6160(69)90007-8

中图分类号：

TF [冶金工业];

学科分类号：

0806 ;

摘要：

Thin films of titanium were prepared under ultra high vacuum conditions so that the low temperature, low pressure oxidation kinetics of titanium could be characterized. The kinetics were followed gravimetrically and the oxide and metal films were examined using electron microscopy and X-ray diffraction. The nucleation of the oxide depended critically upon the titanium film preparations. Analysis of the earliest stages of oxidation indicate that this is limited by surface diffusion of oxygen. The later stages of oxidation are explained by consideration of the effects of metal vacancies generated at the oxide-metal interface. © 1969.

引用

页码：1441 / &

共 6 条

[1] IDENTIFICATION OF TITANIUM OXIDES BY X-RAY POWDER PATTERNS
ANDERSSON, S
COLLEN, B
KRUUSE, G
KUYLENSTIERNA, U
MAGNELI, A
PESTMALIS, H
ASBRINK, S
[J]. ACTA CHEMICA SCANDINAVICA, 1957, 11 (10): : 1653 - 1657
[2] MAGNELI A, 1963, P BUHL INTERN C MATE, P109
[3] MINDEL MJ, TO BE PUBLISHED
[4] MINDEL MJ, 1968, THESIS U PENNSYLVANI
[5] RHODIN TN, 1963, PROCESSES NUCLEATION, P67
[6] ELECTRON MICROSCOPIC STUDY OF TWINS, ANTI-PHASE BOUNDARIES, AND DISLOCATIONS IN THIN FILMS OF RUTILE
VANLANDUYT, J
GEVERS, R
AMELINCKX, S
[J]. PHYSICA STATUS SOLIDI, 1964, 7 (01): : 307 - 329

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