CHEMICALLY VAPOR-DEPOSITED DIAMOND AS A CUTTING-TOOL MATERIAL - A STUDY OF FAILURE MECHANISMS

被引：38

作者：

REINECK, I

SODERBERG, S

EKHOLM, PE

WESTERGREN, K

机构：

[1] AB Sandvik Coromant

来源：

SURFACE & COATINGS TECHNOLOGY | 1993年 / 57卷 / 01期

关键词：

D O I：

10.1016/0257-8972(93)90335-L

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A study of wear mechanisms in chemically vapor deposited thin film diamond on silicon nitride on turning in aluminum-18%silicon is presented. The cutting process was interrupted at intervals and the edges of the cutting tool inserts were characterized in a scanning electron microscope. Two testing methods are compared: longitudinal turning and, as an accelerated test, a facing operation. In these tests two competitive mechanisms can be observed: the attrition of one or a few grains at a time and the formation of cracks.

引用

页码：47 / 50

页数：4

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