APPLICABILITY OF FOCUSED ION-BEAMS FOR NANOTECHNOLOGY

被引：6

作者：

DEJAGER, PWH

KRUIT, P

机构：

[1] Delft University of Technology, 2628 CJ Delft

来源：

MICROELECTRONIC ENGINEERING | 1995年 / 27卷 / 1-4期

关键词：

D O I：

10.1016/0167-9317(94)00117-D

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Ion beams are widespread tools in microtechnology, but their applicability for nanotechnology is not straightforward. However, a light ion can transfer enough energy to the specimen to induce a chemical reaction that results in etching or deposition on a nanometer scale. The needed ion beam resolution of 1 nm can in principle be obtained with an energy filter in the ion optical system to reduce the effect of chromatic aberration. For observation an electron beam in scanning mode has to be used as ions would destroy the nanostructures during observation. With the combination of an electron and an ion beam a tool for nanotechnology should be possible with a relatively high throughput compared to e.g. STM based tools.

引用

页码：327 / 330

页数：4

共 9 条

[1]

Gerlach-Meyer, Ion enhanced gas-surface reactions: a kinetic model for the etching mechanism, Surface Science, 103, pp. 524-534, (1981)

[2]

Ro, Thompson, Melngailis, Mechanism of ion beam induced deposition of gold, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 12, 1, pp. 73-77, (1994)

[3]

Biersack, Haggmark, A Monte Carlo computer program for the transport of energetic ions in amorphous targets, Nuclear Instruments and Methods, 174, pp. 257-269, (1980)

[4]

Barth, Kruit, Addition of different contributions to the charged particle probe size, to be presented at the Charged particle Optics Conference, (1994)

[5]

Zworykin, Morton, Ramberg, Hillier, Vance, Electron optics and the electron microscope, (1945)

[6]

Beuhler, Friedman, A model of secondary electron yields from atomic and polyatomic ion impacts on copper and tungsten surfaces based upon stopping power calculations, Journal of Applied Physics, 9, pp. 3928-3936, (1977)

[7]

Sigmund, Theory of Sputtering I. Sputtering Yield of Amorphous and Polycrystalline Targets, Phys. Rev., 184, pp. 383-416, (1969)

[8]

Herrmann, Detection systems, Quantitative electron microscopy, pp. 119-139, (1984)

[9]

Reimer, Image formation in Low-Voltage Scanning Electron Microscopy, (1993)

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