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IMAGING CONDITIONS FOR ELECTRON-BEAM MICROMACHINING

被引：5
作者：
FONTIJN, LA
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1978年 / 15卷 / 03期
关键词：
D O I：
10.1116/1.569734
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1053 / 1055
页数：3
相关论文
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[3]  
FONTIJN LA, 1976, 7 INT C EL ION BEAM
[4]   COMPARATIVE STUDY OF ZIRCONIATED AND BUILT-UP W THERMALFIELD CATHODE [J].
SWANSON, LW .
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[5]   POINT-CATHODE ELECTRON SOURCES-ELECTRON OPTICS OF INITIAL DIODE REGION [J].
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[6]   ELECTRON-GUN FOR DATA STORAGE MICROMACHINING [J].
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JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06) :1169-1169
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