ELECTROSTATIC COUPLING OF ANTENNA AND THE SHIELDING EFFECT IN INDUCTIVE RF PLASMAS

被引：74

作者：

SUGAI, H

NAKAMURA, K

SUZUKI, K

机构：

[1] Department of Electrical Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1994年 / 33卷 / 4B期

关键词：

INDUCTIVELY COUPLED PLASMA; ELECTROSTATIC COUPLING; CAPACITIVE COUPLING; ANTENNA; FARADAY SHIELD; ELECTROSTATIC SHIELD;

D O I：

10.1143/JJAP.33.2189

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Capacitive coupling from a current-flowing antenna to inductive rf plasma plays an important role not only in the discharge mechanism but also in the impurity release from materials around the antenna. As a result of this coupling, there appears a large negative dc voltage (V(DC)) on the surface of material which insulates the antenna conductor from the plasma. The magnitude of V(DC) is directly measured as a function of rf power, thickness of the insulating material, and the position along the antenna. A simple model to describe the electrostatic antenna-plasma coupling is proposed. In addition, the effect of Faraday shields on the inductively coupled rf discharge is presented.

引用

页码：2189 / 2193

页数：5

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