ATMOSPHERIC-PRESSURE H2-F2 LASER INITIATED BY ELECTRON-BEAM IRRADIATED DISCHARGE

被引：7

作者：

HOFLAND, R ^{[1
]}

CHING, A ^{[1
]}

LUNDQUIS.ML ^{[1
]}

WHITTIER, JS ^{[1
]}

机构：

[1] AEROSP CORP,EL SEGUNDO,CA 90245

来源：

关键词：

D O I：

10.1109/JQE.1974.1068402

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：781 / 781

页数：1

共 7 条

[1] ELECTRON-BEAM-IRRADIATED DISCHARGES CONSIDERED FOR INITIATING HIGH-PRESSURE PULSED CHEMICAL LASERS
HOFLAND, R
LUNDQUIS.ML
CHING, A
WHITTIER, JS
[J]. JOURNAL OF APPLIED PHYSICS, 1974, 45 (05) : 2207 - 2218
[2] HOFLAND R, 1973, 6 AIAA FLUID PLASM D
[3] COMPUTER MODELING AND PARAMETRIC STUDY FOR A PULSED H2 + F2 LASER
KERBER, RL
WHITTIER, JS
EMANUEL, G
[J]. APPLIED OPTICS, 1972, 11 (05): : 1112 - &
[4] KERBER RL, 1973, IEEE J QUANTUM ELECT, VQE 9, P607
[5] MAHADEVAN P, TO BE PUBLISHED
[6] PULSED HF CHEMICAL LASER WITH HIGH ELECTRICAL EFFICIENCY
PARKER, JV
STEPHENS, RR
[J]. APPLIED PHYSICS LETTERS, 1973, 22 (09) : 450 - 452
[7] WHITTIER JS, TO BE PUBLISHED