LASER DAMAGE THRESHOLD FOR DIELECTRIC COATINGS AS DETERMINED BY INCLUSIONS

被引:30
作者
MILAM, D
BRADBURY, RA
BASS, M
机构
[1] USAF,CAMBRIDGE RES LABS,LASER PHYS BRANCH,LG HANSCOM FIELD,BEDFORD,MA 01730
[2] RAYTHEON CO,RES DIV,WALTHAM,MA 02154
关键词
D O I
10.1063/1.1654780
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:654 / 657
页数:4
相关论文
共 13 条
[1]  
BASS M, 1971, IEEE J QUANTUM ELECT, VQE 7, P350
[2]  
Bliss E. S., 1971, Opto-Electronics, V3, P99, DOI 10.1007/BF01424087
[3]  
BLISS ES, 1973, APPL OPT, V12, P602
[4]  
BLISS ES, 1972, 720233 AIR FORC CAMB
[5]  
BLISS ES, 1972, NBS372 SPEC PUBL
[6]  
DESHAZER LG, F1962871C0220QTR CON
[7]  
DESHAZER LG, 1973, 5 P ASTMNBS S DAM LA
[8]   CONFIRMATION OF AN ELECTRON AVALANCHE CAUSING LASER-INDUCED BULK DAMAGE AT 1.06 MU-M [J].
FRADIN, DW ;
YABLONOVITCH, E ;
BASS, M .
APPLIED OPTICS, 1973, 12 (04) :700-709
[9]   MECHANISM OF INCLUSION DAMAGE IN LASER GLASS [J].
HOPPER, RW ;
UHLMANN, DR .
JOURNAL OF APPLIED PHYSICS, 1970, 41 (10) :4023-&
[10]  
MILAM D, 1973, 5 P ASTMNBS S DAM LA