SEMICONDUCTING CDTE MICROCRYSTALLINE-DOPED SIO2 GLASS THIN-FILMS PREPARED BY RF-SPUTTERING

被引：48

作者：

NASU, H ^{[1
]}

TSUNETOMO, K ^{[1
]}

TOKUMITSU, Y ^{[1
]}

OSAKA, Y ^{[1
]}

机构：

[1] HIROSHIMA UNIV,FAC ENGN,DEPT ELECT ENGN,HIROSHIMA 724,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1989年 / 28卷 / 05期

关键词：

D O I：

10.1143/JJAP.28.L862

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L862 / L864

页数：3

共 15 条

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