THE MEASUREMENT OF THE X-RAY-SCATTERING FACTORS OF SILICON FROM THE FINE-STRUCTURE OF LAUE-CASE ROCKING CURVES

被引：22

作者：

BONSE, U

TEWORTE, R

机构：

来源：

JOURNAL OF APPLIED CRYSTALLOGRAPHY | 1980年 / 13卷 / OCT期

关键词：

D O I：

10.1107/S0021889880012460

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

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收藏

页码：410 / 416

页数：7

相关论文

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