MEASURING EXPONENTIAL NONLINEARITY OF SPECTROPHOTOMETERS

被引：2

作者：

ANDERSON, WJ ^{[1
]}

HANSEN, WN ^{[1
]}

机构：

[1] UTAH STATE UNIV,PHYS DEPT,LOGAN,UT 84322

来源：

APPLIED OPTICS | 1973年 / 12卷 / 05期

关键词：

D O I：

10.1364/AO.12.001038

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：1038 / 1041

页数：4

共 8 条

[1]

BISCHOFF K, 1961, INSTRUMENTENK, V69, P143

[2] TECHNIQUE FOR MEASURING PHOTOMETRIC ACCURACY [J].

HAWES, RC .

APPLIED OPTICS, 1971, 10 (06) :1246-&

[3]

ISHIDA Y, 1958, J MECH LAB TOKYO, V12, P206

[4]

KINOSITA K, 1965, PROGRESS OPTICS, V4

[5]

Morey George W., 1938, PROPERTIES GLASS

[6] A photoelectric spectrophotometer of high accuracy [J].

Preston, JS ;

Cuckow, FW .

PROCEEDINGS OF THE PHYSICAL SOCIETY, 1936, 48 :869-880

[7] TESTING SPECTROPHOTOMETER LINEARITY [J].

REULE, A .

APPLIED OPTICS, 1968, 7 (06) :1023-&

[8]

Stratton J.A, 1941, ELECTROMAGNETIC THEO