COMMENTS ON ELECTRICAL PROPERTIES OF AL-SIOX-AG THIN-FILM CATHODES

被引：6

作者：

GOULD, RD

机构：

来源：

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1972年 / 9卷 / 02期

关键词：

D O I：

10.1002/pssa.2210090262

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：K177 / &

共 10 条

[1] ELECTRICAL PROPERTIES OF AL-SIOX-AG THIN-FILM CATHODES [J].

COLLINS, RA ;

EDGE, IA ;

LEGG, KO .

PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 1972, 9 (01) :309-+

[2] HOT ELECTRON TRANSPORT AND EMISSION IN AU-SIO-AU THIN FILM CATHODES [J].

COLLINS, RA ;

GOULD, RD .

SOLID-STATE ELECTRONICS, 1971, 14 (09) :805-&

[3] ATTENUATION LENGTH MEASUREMENTS OF HOT ELECTRONS IN METAL FILMS [J].

CROWELL, CR ;

HOWARTH, LE ;

SPITZER, WG ;

LABATE, EE .

PHYSICAL REVIEW, 1962, 127 (06) :2006-&

[4] ELECTRON EMISSION ELECTROLUMINESCENCE AND VOLTAGE-CONTROLLED NEGATIVE RESISTANCE IN AL-AL2O3-AU DIODES [J].

HICKMOTT, TW .

JOURNAL OF APPLIED PHYSICS, 1965, 36 (06) :1885-&

[5] SLOW ELECTRON TRANSFER THROUGH EVAPORATED AU FILMS [J].

KANTER, H .

JOURNAL OF APPLIED PHYSICS, 1963, 34 (12) :3629-&

[6]

KITTEL C, 1966, INTRO SOLID STATE PH, P208

[7] RANGE OF EXCITED ELECTRONS + HOLES IN METALS + SEMICONDUCTORS [J].

MOTIZUKI, K ;

SPARKS, M .

JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1964, 19 (04) :486-+

[8] RANGE OF EXCITED ELECTRONS IN METALS [J].

QUINN, JJ .

PHYSICAL REVIEW, 1962, 1 (04) :1453-+

[9] THE RANGE OF HOT ELECTRONS AND HOLES IN METALS [J].

QUINN, JJ .

APPLIED PHYSICS LETTERS, 1963, 2 (09) :167-169

[10] INJECTION AND EMISSION OF HOT ELECTRONS IN THIN-FILM TUNNEL EMITTERS [J].

SAVOYE, ED ;

ANDERSON, DE .

JOURNAL OF APPLIED PHYSICS, 1967, 38 (08) :3245-&

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