GIANT MAGNETORESISTANCE IN NI-FE/CU MULTILAYERS FORMED BY ION-BEAM SPUTTERING

被引：55

作者：

NAKATANI, R ^{[1
]}

DEI, T ^{[1
]}

KOBAYASHI, T ^{[1
]}

SUGITA, Y ^{[1
]}

机构：

[1] HITACHI MET LTD,MAGNET & ELECTR MAT RES LAB,KUMAGAYA,SAITAMA 360,JAPAN

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1992年 / 28卷 / 05期

关键词：

D O I：

10.1109/20.179591

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In Ni-Fe/Cu multilayers formed by ion beam sputtering, oscillatory magnetoresistance changes with copper thickness have been observed at room temperature. As the thickness of the Ni-Fe layer increased, the magnetoresistance ratio increased, reached a maximum value at 1.0 - 1.1 nm, and decreased slightly above 1.1 nm. The maximum magnetoresistance ratio was 19% for the Ni-Fe(1.0 nm)/Cu(1.0 nm) multilayer at room temperature.

引用

页码：2668 / 2670

页数：3

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