EFFECT OF IMPRESSED CURRENT AND SHORT-CIRCUITING ON THE GROWTH OF CU2O LAYER ON COPPER EXPOSED TO DRY AIR AT 1123-K

被引：9

作者：

ANANTH, V

BOSE, SK

SIRCAR, SC

机构：

来源：

SCRIPTA METALLURGICA | 1980年 / 14卷 / 07期

关键词：

D O I：

10.1016/0036-9748(80)90271-9

中图分类号：

TF [冶金工业];

学科分类号：

0806 ;

摘要：

引用

页码：687 / 693

页数：7

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