ADVANCED CHARACTERIZATION - AN INDISPENSABLE TOOL FOR UNDERSTANDING ULTRA CLEAN PROCESSING

被引：3

作者：

VANDERVORST, W

BENDER, H

STORM, W

HEYNS, M

POLLEUNIS, C

BERTRAND, P

机构：

[1] IMEC, B-3001 Leuven

[2] PCPM, Universite Catholic de Louvain, Louvain-la-Neuve

来源：

MICROELECTRONIC ENGINEERING | 1995年 / 28卷 / 1-4期

关键词：

D O I：

10.1016/0167-9317(95)00009-W

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Economical and environmental considerations have led to the replacement of Ultra Clean Processing by the ''Just-Clean-Enough'' concept which is based on a fundamental understanding of the effect of contaminants and consequently on defining tolerable limits for the contamination. In this paper an overview is given of the characterisation tools which can be used in this context for metal detection, surface chemistry and roughening and organic contamination.

引用

页码：27 / 34

页数：8

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