THE APPLICATION OF ELECTRON-BEAM LITHOGRAPHY TO DEVICE FABRICATION FOR OPTICAL COMMUNICATION-SYSTEMS

被引：4

作者：

JONES, ME

DIX, C

MCKEE, P

BROUGHTON, C

RANASINGHE, D

WOOD, D

机构：

[1] British Telecom Research Laboratories, Martlesham Heath, IPSWICH

来源：

MICROELECTRONIC ENGINEERING | 1991年 / 13卷 / 1-4期

关键词：

D O I：

10.1016/0167-9317(91)90117-V

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Electron beam lithography (EBL) has been used to advantage in the development of a range of devices for optical communications systems. These include (a) waveguide components which contain high aspect ratio structures with large radius curves, (b) sub-micron period grating structures for advanced laser systems, and (c) the fabrication of holographic elements for spatial optical systems. The application of the technology to these three classes of devices is described, highlighting the benefits gained from the use of EBL.

引用

页码：385 / 390

页数：6

共 14 条

[1]

Stallard, Et al., Integrated optic devices for coherent transmission, Journal of Lightwave Technology, 4 LT, pp. 852-857, (1886)

[2]

Flavin, Et al., Proc. Microcircuit Engineering '82, (1982)

[3]

Turner, Et al., Appl Phys Lett, 23, pp. 333-334, (1973)

[4]

Johnson, Et al., Appl Optics, 17, pp. 1165-1181, (1978)

[5]

Westbrook, Et al., High-quality InP surface corrugations for 1.55 μm InGaAsP DFB lasers fabricated using electron-beam lithography, Electronics Letters, 18, 11, (1982)

[6]

Koch, Koren, J. Lightwave Technology, 8, 3, pp. 274-293, (1990)

[7]

Yariv, Nakamura, Periodic structures for integrated optics, IEEE Journal of Quantum Electronics, QE13, 4, pp. 233-253, (1977)

[8]

Nakao, Et al., Electronics Letters, 25, 2, pp. 148-149, (1989)

[9]

Jones, Dix, British Telecom Technol J, 7, 1, pp. 25-43, (1989)

[10]

Bennion, Et al., Electronics Letters, 22, pp. 341-343, (1986)

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