THE BEHAVIOR OF INCORPORATED IMPURITIES IN TANTALUM ANODIC OXIDE-FILMS AT THE DIELECTRIC-BREAKDOWN

被引:5
作者
ARIFUKU, F
YONEYAMA, H
TAMURA, H
机构
关键词
D O I
10.1016/0013-4686(80)90039-0
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:863 / 865
页数:3
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共 17 条
[1]   SPARKING VOLTAGES OBSERVED ON ANODIZATION OF SOME VALVE METALS [J].
ALWITT, RS ;
VIJH, AK .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (03) :388-&
[2]   INFLUENCE OF ELECTROLYTE ON COMPOSITION OF ANODIC OXIDE FILMS ON TANTALUM [J].
AMSEL, G ;
CHERKI, C ;
FEUILLADE, G ;
NADAI, JP .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1969, 30 (09) :2117-+
[3]   INCORPORATION OF ELECTROLYTE INTO ANODIC OXIDE FILM ON TANTALUM [J].
ARIFUKU, F ;
IWAKURA, C ;
YONEYAMA, H ;
TAMURA, H .
DENKI KAGAKU, 1978, 46 (01) :19-24
[4]   MIGRATION OF INCORPORATED PHOSPHORUS IN THE ANODIC OXIDE FILM FORMATION OF TANTALUM [J].
ARIFUKU, F ;
YONEYAMA, H ;
TAMURA, H .
ELECTROCHIMICA ACTA, 1979, 24 (09) :1019-1022
[5]   ANALYSIS OF THIN FILMS BY ION MICROPROBE MASS SPECTROMETRY [J].
EVANS, CA ;
PEMSLER, JP .
ANALYTICAL CHEMISTRY, 1970, 42 (09) :1060-&
[6]   PRODUCTION AND BREAKDOWN OF PASSIVITY OF METALS [J].
HOAR, TP .
CORROSION SCIENCE, 1967, 7 (06) :341-&
[7]  
ODWYER JJ, 1973, THEORY ELECTRICAL CO
[8]   IMPURITY DISTRIBUTIONS IN ANODIC FILMS ON TANTALUM [J].
PAWEL, RE ;
PEMSLER, JP ;
EVANS, CA .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (01) :24-+
[9]  
TAKAMURA T, 1975, DENKI KAGAKU, V43, P219
[10]  
TAMURA H, 1974, JPN J APPL PHYS, P379