EXCIMER-LASER ABLATION OF ND-YAG AND ND-GLASS

被引：19

作者：

JACKSON, SR ^{[1
]}

METHERINGHAM, WJ ^{[1
]}

DYER, PE ^{[1
]}

机构：

[1] UNIV HULL,DEPT APPL PHYS,KINGSTON HULL HU6 7RX,N HUMBERSIDE,ENGLAND

来源：

APPLIED SURFACE SCIENCE | 1995年 / 86卷 / 1-4期

关键词：

D O I：

10.1016/0169-4332(94)00415-3

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The excimer laser ablation of neodymium (Nd) doped glass and Nd doped yttrium aluminium garnet (YAG) crystals has been performed using 193 and 248 nm radiation. Etch rate versus fluence (energy per unit area) plots show that the ablation thresholds are in the range 0.5-1.6 J/cm(2). The effective absorption coefficients thus measured were found to be of the order of 10(4)-10(5) cm(-1), two or three orders of magnitude greater than the small signal absorption coefficient. The ablation of Nd:YAG and Nd:grass at 193 nm produced etch pits of superior quality to those pits produced using 248 nm laser exposure. Time integrated emission spectra of the ablated plumes in vacuum showed up to one hundred lines for Nd:YAG at both wavelengths while the Nd:glass spectra were simpler, considerably so for 248 nm irradiation.

引用

页码：223 / 227

页数：5

共 8 条

[1]

BEECH F, 1992, PHOTOCHEMICAL PROCES

[2] CONTROLLED ETCHING OF SILICATE-GLASSES BY PULSED ULTRAVIOLET-LASER RADIATION [J].

BRAREN, B ;

SRINIVASAN, R .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (02) :537-541

[3] LASER ENERGY DEPOSITION AT SAPPHIRE SURFACES STUDIED BY PULSED PHOTOTHERMAL DEFORMATION [J].

DREYFUS, RW ;

MCDONALD, FA ;

VONGUTFELD, RJ .

APPLIED PHYSICS LETTERS, 1987, 50 (21) :1491-1493

[4]

Dyer P.E., 1992, PHOTOCHEMICAL PROCES

[5] FAST, SENSITIVE LASER DEFLECTION SYSTEM SUITABLE FOR TRANSIENT PLASMA ANALYSIS [J].

ENLOE, CL ;

GILGENBACH, RM ;

MEACHUM, JS .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1987, 58 (09) :1597-1600

[6] NANOSECOND AND FEMTOSECOND EXCIMER LASER ABLATION OF FUSED-SILICA [J].

IHLEMANN, J ;

WOLFF, B ;

SIMON, P .

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1992, 54 (04) :363-368

[7]

KEY PH, 1989, THESIS U HULL

[8]

READY JF, 1971, EFFECTS HIGH POWER L

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