VACANCY CONTROLLED INTERDIFFUSION OF THE GROUP-V SUBLATTICE IN STRAINED INGAAS/INGAASP QUANTUM-WELLS

被引:23
作者
GILLIN, WP [1 ]
RAO, SS [1 ]
BRADLEY, IV [1 ]
HOMEWOOD, KP [1 ]
SMITH, AD [1 ]
BRIGGS, ATR [1 ]
机构
[1] BNR EUROPE LTD, HARLOW CM17 9NA, ESSEX, ENGLAND
关键词
D O I
10.1063/1.109911
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this letter we present the results of a photoluminescence study of the interdiffusion of arsenic and phosphorous in the In0.66Ga0.33As/In0.66Ga0.33As0.7P0.3 system over the temperature range 950-600-degrees-C. We have shown that the diffusion is Fickian with no dependence of the diffusion coefficient on the substrate doping type or etch pit density. For both tin- and sulfur-doped substrates the diffusion can be described by a diffusion coefficient D, which is given by D=D0 exp(-E(A)/kT), where D0=23 cm2/s and E(A)=3.7 eV for temperatures greater than 675-degrees-C. This activation energy is the same as that determined for the group III interdiffusion in In0.2Ga0.8As/GaAs. Below this temperature a lower activation energy process takes over with D0=5 X 10(-10) cm2/s and E(A) = 1.7 eV.
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页码:797 / 799
页数:3
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