SIMULATION OF MICROSTRUCTURE AND SURFACE PROFILES OF THIN-FILMS FOR VLSI METALLIZATION

被引:13
作者
SMY, T
DEW, SK
BRETT, MJ
机构
关键词
D O I
10.1557/S0883769400045619
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
[No abstract available]
引用
收藏
页码:65 / 69
页数:5
相关论文
共 16 条
  • [1] BURGGRAAF R, 1990, SEMICONDUCTOR IN DEC, P28
  • [2] A UNIFIED LINE-OF-SIGHT MODEL OF DEPOSITION IN RECTANGULAR TRENCHES
    CALE, TS
    RAUPP, GB
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1990, 8 (06): : 1242 - 1248
  • [3] STEP COVERAGE, UNIFORMITY AND COMPOSITION STUDIES USING INTEGRATED VAPOR TRANSPORT AND FILM-DEPOSITION MODELS
    DEW, S
    SMY, T
    BRETT, M
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (02): : 1140 - 1145
  • [4] MODELING BIAS SPUTTER PLANARIZATION OF METAL-FILMS USING A BALLISTIC DEPOSITION SIMULATION
    DEW, SK
    SMY, T
    TAIT, RN
    BRETT, MJ
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1991, 9 (03): : 519 - 523
  • [5] SIMULATION OF ELEVATED-TEMPERATURE ALUMINUM METALLIZATION USING SIMBAD
    DEW, SK
    SMY, T
    BRETT, MJ
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1992, 39 (07) : 1599 - 1606
  • [6] MOLECULAR-DYNAMICS MODELING OF VAPOR-PHASE AND VERY-LOW-ENERGY ION-BEAM CRYSTAL-GROWTH PROCESSES
    DODSON, BW
    [J]. CRITICAL REVIEWS IN SOLID STATE AND MATERIALS SCIENCES, 1990, 16 (02) : 115 - 130
  • [7] STRESS AND MICROSTRUCTURE OF SPUTTER-DEPOSITED THIN-FILMS - MOLECULAR-DYNAMICS SIMULATIONS AND EXPERIMENT
    FANG, CC
    JONES, F
    KOLA, RR
    CELLER, GK
    PRASAD, V
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06): : 2947 - 2952
  • [8] FRIEDRICH LJ, IN PRESSS THIN SOLID
  • [9] GOLDHAM W, 1992, IEEE T ELECT DEV, V39, P1599
  • [10] LI P, J ELECT MAT, V23, P1215