DIAGNOSTICS OF MICROWAVE PLASMA BY LASER-INDUCED FLUORESCENCE

被引:20
作者
NINOMIYA, K
SUZUKI, K
NISHIMATSU, S
OKADA, O
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1986年 / 4卷 / 03期
关键词
D O I
10.1116/1.573939
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:1791 / 1794
页数:4
相关论文
共 16 条
[1]  
DAVIS GP, 1983, J APPL PHYS, V54, P3080, DOI 10.1063/1.332514
[2]  
FLAMM DL, 1979, SOLID STATE TECHNOL, V22, P109
[3]  
Gottscho R. A., 1983, Plasma Chemistry and Plasma Processing, V3, P193, DOI 10.1007/BF00566020
[4]   OPTICAL SPECTROSCOPY FOR DIAGNOSTICS AND PROCESS-CONTROL DURING GLOW-DISCHARGE ETCHING AND SPUTTER DEPOSITION [J].
GREENE, JE .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (05) :1718-1729
[5]   DETECTION OF CF2 RADICALS IN A PLASMA-ETCHING REACTOR BY LASER-INDUCED FLUORESCENCE SPECTROSCOPY [J].
HARGIS, PJ ;
KUSHNER, MJ .
APPLIED PHYSICS LETTERS, 1982, 40 (09) :779-781
[6]   SPECTROSCOPY AND PHOTOPHYSICS OF THE CF2A 1B1-X 1A1 SYSTEM [J].
KING, DS ;
SCHENCK, PK ;
STEPHENSON, JC .
JOURNAL OF MOLECULAR SPECTROSCOPY, 1979, 78 (01) :1-15
[7]  
KOTAKE M, 1963, CONSTANTS ORGANIC CO, P537
[8]   REACTANT SUPPLY IN REACTIVE ION ETCHING [J].
MAUER, JL ;
LOGAN, JS .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02) :404-406
[9]   DIFLUOROCARBENE EMISSION-SPECTRA FROM FLUOROCARBON PLASMAS AND ITS RELATIONSHIP TO FLUOROCARBON POLYMER FORMATION [J].
MILLARD, MM ;
KAY, E .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (01) :160-165
[10]   AN EXPERIMENTAL SYSTEM FOR SURFACE-REACTION STUDIES IN MICROWAVE PLASMA-ETCHING [J].
NINOMIYA, K ;
SUZUKI, K ;
NISHIMATSU, S ;
GOTOH, Y ;
OKADA, O .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1984, 2 (04) :645-652