共 11 条
[3]
ITO H, 1988, P KTI MICROELECTRONI, P81
[5]
IWAYANAGI T, 1988, ADV CHEM SER, V218, P109
[6]
CHARACTERIZATION OF A HIGH-RESOLUTION NOVOLAK BASED NEGATIVE ELECTRON-BEAM RESIST WITH 4-MU-C/CM2 SENSITIVITY
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1988, 6 (01)
:379-383
[9]
PROCESS-CONTROL WITH CHEMICAL AMPLIFICATION RESISTS USING DEEP ULTRAVIOLET AND X-RAY-RADIATION
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1988, 6 (06)
:2303-2307
[10]
SHIRAISHI H, 1984, ACS SYM SER, V346, P77