GASEOUS SATURABLE ABSORBERS FOR THE HELIOS CO2-LASER SYSTEM

被引：11

作者：

HAGLUND, RF

NOWAK, AV

CZUCHLEWSKI, SJ

机构：

来源：

IEEE JOURNAL OF QUANTUM ELECTRONICS | 1981年 / 17卷 / 09期

关键词：

D O I：

10.1109/JQE.1981.1071334

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1799 / 1808

页数：10

共 48 条

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IEEE JOURNAL OF QUANTUM ELECTRONICS, 1981, 17 (09) :1662-1678

[8] PASSIVE Q-SWITCHING OF CO2 LASER BY CH3F AND PF5 GASES [J].

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[10]

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