PRACTICAL DEFINITION OF THE PLASMA SHEATH EDGE FOR MODELING PLANAR GLOW-DISCHARGES

被引:3
作者
WANG, YC
机构
[1] Radiation Laboratory, University of Notre Dame, Notre Dame
关键词
D O I
10.1063/1.113972
中图分类号
O59 [应用物理学];
学科分类号
摘要
While the parallel-plate capacitive model is often employed to describe the electrical behavior of a plasma sheath, the simple question of how far apart the two plates are for a given plasma cannot be easily answered yet because of the lack of a workable definition of the sheath edge. The sheath edge estimated with the Child-Langmuir equation may misplace as much as 40% of the total space charge outside the sheath. An alternative practical definition of the sheath edge is proposed that includes almost all space charge within the sheath.© 1995 American Institute of Physics.
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页码:2329 / 2330
页数:2
相关论文
共 14 条
[1]   CURRENT LIMITATION IN THE LOW-PRESSURE MERCURY ARC [J].
ALLEN, JE ;
THONEMANN, PC .
PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON SECTION B, 1954, 67 (418) :768-774
[2]  
Bohm D., 1949, CHARACTERISTICS ELEC, P77
[3]   THE MECHANISM OF POSITIVE ION COLLECTION BY A SPHERICAL PROBE IN A DENSE GAS [J].
BOYD, RLF .
PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON SECTION B, 1951, 64 (381) :795-804
[4]  
Chapman B., 1980, GLOW DISCHARGE PROCE
[5]  
CHEN FF, 1984, INTRO PLASMA PHYSICS
[6]  
GANCIU M, 1993, J PHYS D, V27, P529
[7]   THE GASEOUS ELECTRONICS CONFERENCE RADIOFREQUENCY REFERENCE CELL - A DEFINED PARALLEL-PLATE RADIOFREQUENCY SYSTEM FOR EXPERIMENTAL AND THEORETICAL-STUDIES OF PLASMA-PROCESSING DISCHARGES [J].
HARGIS, PJ ;
GREENBERG, KE ;
MILLER, PA ;
GERARDO, JB ;
TORCZYNSKI, JR ;
RILEY, ME ;
HEBNER, GA ;
ROBERTS, JR ;
OLTHOFF, JK ;
WHETSTONE, JR ;
VANBRUNT, RJ ;
SOBOLEWSKI, MA ;
ANDERSON, HM ;
SPLICHAL, MP ;
MOCK, JL ;
BLETZINGER, P ;
GARSCADDEN, A ;
GOTTSCHO, RA ;
SELWYN, G ;
DALVIE, M ;
HEIDENREICH, JE ;
BUTTERBAUGH, JW ;
BRAKE, ML ;
PASSOW, ML ;
PENDER, J ;
LUJAN, A ;
ELTA, ME ;
GRAVES, DB ;
SAWIN, HH ;
KUSHNER, MJ ;
VERDEYEN, JT ;
HORWATH, R ;
TURNER, TR .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1994, 65 (01) :140-154
[8]  
HORWITZ CM, 1982, J VAC SCI TECHNOL A, V1, P60
[9]   APPLICATION OF RF DISCHARGES TO SPUTTERING [J].
KOENIG, HR ;
MAISSEL, LI .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1970, 14 (02) :168-&
[10]  
KOHLER K, 1985, J APPL PHYS, V57, P59, DOI 10.1063/1.335396