DETERMINATION OF OXYGEN IN METALS AND SEMICONDUCTORS BY MEANS OF O-16(T,N)18 F REACTION

被引：35

作者：

VALLADON, M ^{[1
]}

DEBRUN, JL ^{[1
]}

机构：

[1] CNRS,CYCLOTRON SERV,APPLICAT REACT NUCL ANAL CHIM GRP,F-45045 ORLEANS,FRANCE

来源：

JOURNAL OF RADIOANALYTICAL CHEMISTRY | 1977年 / 39卷 / 1-2期

关键词：

D O I：

10.1007/BF02517244

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

引用

页码：385 / 395

页数：11

共 8 条

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[2] USE OF LOW ENERGY DEUTERONS AND TRITONS FOR DETERMINATION OF CARBON AND OXYGEN ON METAL SURFACES
BARRANDON, JN
QUAGLIA, L
DEBRUN, JL
CUYPERS, M
ROBAYE, G
[J]. JOURNAL OF RADIOANALYTICAL CHEMISTRY, 1970, 4 (01): : 115 - +
[3] BARRANDON JN, 1968, CR ACAD SCI C CHIM, V267, P1306
[4] HOSTE J, COMMUNICATION
[5] PAUWELS J, 1975, ANALUSIS, V3, P434
[6] QUAGLIA L, 1976, ITE90 BUR EUR REP
[7] SENSITIVITIES FOR ACTIVATION ANALYSIS OF 15 LIGHT ELEMENTS WITH 18-MEV HELIUM-3 PARTICLES
RICCI, E
HAHN, RL
[J]. ANALYTICAL CHEMISTRY, 1967, 39 (07) : 794 - &
[8] WILLIAMSON CF, 1966, R3042 CEA REP