REPLICATION OF VERY SMALL PERIODIC GRATINGS WITH PROXIMITY X-RAY-LITHOGRAPHY

被引:14
作者
CHEN, Y
KUPKA, RK
ROUSSEAUX, F
RAVET, MF
CARCENAC, F
MADOURI, A
LAUNOIS, H
机构
[1] Laboratoire de Microstructures et de Microélectronique (CNRS), 92225 Bagneux
关键词
D O I
10.1016/0167-9317(94)90146-5
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper describes our recent results in high resolution synchrotron radiation lithography. Theoretically we show an image analysis based on the absorbed dose distribution in the x-ray resist rather than on the diffraction intensity calculations. Experimental results are presented, demonstrating a successful replication of very small periodic gratings using high resolution SiC/W masks and a high performance commercial x-ray stepper.
引用
收藏
页码:239 / 242
页数:4
相关论文
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