FABRICATION OF SUBMICROMETER FEATURES ON CURVED SUBSTRATES BY MICROCONTACT PRINTING

被引：355

作者：

JACKMAN, RJ ^{[1
]}

WILBUR, JL ^{[1
]}

WHITESIDES, GM ^{[1
]}

机构：

[1] HARVARD UNIV, DEPT CHEM, CAMBRIDGE, MA 02138 USA

来源：

SCIENCE | 1995年 / 269卷 / 5224期

关键词：

D O I：

10.1126/science.7624795

中图分类号：

O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];

学科分类号：

07 ; 0710 ; 09 ;

摘要：

Microcontact printing (mu CP) has been used to produce patterned self-assembled monolayers (SAMs) with submicrometer features on curved substrates with radii of curvature as small as 25 micrometers. Wet-chemical etching that uses the patterned SAMs as resists transfers the patterns formed by mu CP into gold. At present, there is no comparable method for microfabrication on curved surfaces.

引用

页码：664 / 666

页数：3

共 15 条

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